photorésist à film sec

photorésist à film sec
sausasis plėvelinis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry-film photoresist; dry-laminated photoresist vok. Trockenfilmfotoresist, n rus. сухой плёночный фоторезист, m pranc. photorésist à film sec, m

Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. . 2000.

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  • dry-film photoresist — sausasis plėvelinis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry film photoresist; dry laminated photoresist vok. Trockenfilmfotoresist, n rus. сухой плёночный фоторезист, m pranc. photorésist à film sec, m …   Radioelektronikos terminų žodynas

  • dry-laminated photoresist — sausasis plėvelinis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry film photoresist; dry laminated photoresist vok. Trockenfilmfotoresist, n rus. сухой плёночный фоторезист, m pranc. photorésist à film sec, m …   Radioelektronikos terminų žodynas

  • Trockenfilmfotoresist — sausasis plėvelinis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry film photoresist; dry laminated photoresist vok. Trockenfilmfotoresist, n rus. сухой плёночный фоторезист, m pranc. photorésist à film sec, m …   Radioelektronikos terminų žodynas

  • sausasis plėvelinis fotorezistas — statusas T sritis radioelektronika atitikmenys: angl. dry film photoresist; dry laminated photoresist vok. Trockenfilmfotoresist, n rus. сухой плёночный фоторезист, m pranc. photorésist à film sec, m …   Radioelektronikos terminų žodynas

  • сухой плёночный фоторезист — sausasis plėvelinis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry film photoresist; dry laminated photoresist vok. Trockenfilmfotoresist, n rus. сухой плёночный фоторезист, m pranc. photorésist à film sec, m …   Radioelektronikos terminų žodynas

  • Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

  • Polymer — Appearance of real linear polymer chains as recorded using an atomic force microscope on surface under liquid medium. Chain contour length for this polymer is 204 nm; thickness is 0.4 nm.[1] A polymer is a large molecule (macromolecule …   Wikipedia

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